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PLASMA CLEANING DEVICE AND PLASMA CLEANING METHOD FOR ELECTRONIC COMPONENT

机译:电子元件的等离子体清洗装置及等离子体清洗方法

摘要

PROBLEM TO BE SOLVED: To maintain a unit process time and realize improvement in productivity, by determining the timing for maintenance of a vacuum chamber from the result of measurement of the degree of vacuum at the time of vacuum exhaust inside the vacuum chamber, and indicating maintenance of the vacuum chamber on the basis of a command from the result of determination. ;SOLUTION: A plasma generation gas such as argon gas is supplied into a vacuum chamber 5 by a gas supply unit 17, and vacuum exhaust inside the vacuum chamber 5 is carried out by a vacuum exhaust unit 14. In this case, the degree of vacuum inside the vacuum chamber 5 is measured by a vacuum gauge 15 as means for measuring the degree of vacuum, and measurement data is sent to a control section. The control section judges the degree of attainment with respect to the degree of vacuum at the time of vacuum exhaust inside the vacuum chamber 5 from the result of measurement of the vacuum gauge 15, and determines whether or not to carry out maintenance from the judgment. On the basis of a command from the result of determination, maintenance such as cleaning and replacement of a shield member inside the vacuum chamber 5 is indicated.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:通过从真空室内部抽真空时的真空度的测量结果确定真空室的维护时间,从而维持单位处理时间并实现生产率的提高,并指示根据确定结果发出的命令对真空室进行维护。 ;解决方案:等离子产生气体,例如氩气,由气体供应单元17供应到真空室5中,真空室5内的真空排放是由真空排放单元14进行的。作为测量真空度的装置,通过真空计15测量真空室5内的真空,并将测量数据发送至控制部。控制部根据真空计15的测量结果来判断相对于真空腔室5内的真空排气时的真空度的达到程度,并根据该判断来确定是否进行维护。根据确定结果的命令,指示了诸如清洁和更换真空室5内的屏蔽构件之类的维护。;版权所有:(C)1999,JPO

著录项

  • 公开/公告号JPH1154487A

    专利类型

  • 公开/公告日1999-02-26

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP19970214283

  • 发明设计人 HAJI HIROSHI;

    申请日1997-08-08

  • 分类号H01L21/3065;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 02:33:32

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