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PLASMA CLEANING DEVICE AND PLASMA CLEANING METHOD FOR ELECTRONIC COMPONENT
PLASMA CLEANING DEVICE AND PLASMA CLEANING METHOD FOR ELECTRONIC COMPONENT
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机译:电子元件的等离子体清洗装置及等离子体清洗方法
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摘要
PROBLEM TO BE SOLVED: To maintain a unit process time and realize improvement in productivity, by determining the timing for maintenance of a vacuum chamber from the result of measurement of the degree of vacuum at the time of vacuum exhaust inside the vacuum chamber, and indicating maintenance of the vacuum chamber on the basis of a command from the result of determination. ;SOLUTION: A plasma generation gas such as argon gas is supplied into a vacuum chamber 5 by a gas supply unit 17, and vacuum exhaust inside the vacuum chamber 5 is carried out by a vacuum exhaust unit 14. In this case, the degree of vacuum inside the vacuum chamber 5 is measured by a vacuum gauge 15 as means for measuring the degree of vacuum, and measurement data is sent to a control section. The control section judges the degree of attainment with respect to the degree of vacuum at the time of vacuum exhaust inside the vacuum chamber 5 from the result of measurement of the vacuum gauge 15, and determines whether or not to carry out maintenance from the judgment. On the basis of a command from the result of determination, maintenance such as cleaning and replacement of a shield member inside the vacuum chamber 5 is indicated.;COPYRIGHT: (C)1999,JPO
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