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PLASMA-CLEANING DEVICE AND PLASMA-CLEANING METHOD OF ELECTRONIC COMPONENT
PLASMA-CLEANING DEVICE AND PLASMA-CLEANING METHOD OF ELECTRONIC COMPONENT
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机译:电子部件的等离子体清洗装置及等离子体清洗方法
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摘要
PROBLEM TO BE SOLVED: To provide a plasma-cleaning device and a plasma-cleaning method of an electronic component which can improve product yield by reducing number of works to be discarded. ;SOLUTION: In a device, a plasma treatment is performed by generating plasma through the application of a high-frequency voltage to an electrode inside a vacuum chamber. In the process, treatment hysteresis of the electronic component during treatment is stored by a storage part 71, and if abnormality of a main power supply 61 is detected by a power supply abnormality detection means 62, power is supplied to the storage part 71 and a control part 70 from a battery 63 as a back-up power supply, treatment of the hysteresis for an electronic component whose treatment is discontinued is transmitted from the storage part 71 to the control part 70 and treatment of an electronic component is continued, based on the treatment hysteresis after power supply has been restored. Thereby, it is possible to improve product yield by the use of an electronic component whose treatment was discontinued and discarded in conventional methods.;COPYRIGHT: (C)1999,JPO
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