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PLASMA-CLEANING DEVICE AND PLASMA-CLEANING METHOD OF ELECTRONIC COMPONENT

机译:电子部件的等离子体清洗装置及等离子体清洗方法

摘要

PROBLEM TO BE SOLVED: To provide a plasma-cleaning device and a plasma-cleaning method of an electronic component which can improve product yield by reducing number of works to be discarded. ;SOLUTION: In a device, a plasma treatment is performed by generating plasma through the application of a high-frequency voltage to an electrode inside a vacuum chamber. In the process, treatment hysteresis of the electronic component during treatment is stored by a storage part 71, and if abnormality of a main power supply 61 is detected by a power supply abnormality detection means 62, power is supplied to the storage part 71 and a control part 70 from a battery 63 as a back-up power supply, treatment of the hysteresis for an electronic component whose treatment is discontinued is transmitted from the storage part 71 to the control part 70 and treatment of an electronic component is continued, based on the treatment hysteresis after power supply has been restored. Thereby, it is possible to improve product yield by the use of an electronic component whose treatment was discontinued and discarded in conventional methods.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:提供一种电子部件的等离子体清洁装置和等离子体清洁方法,该等离子体清洁装置和等离子体清洁方法可通过减少要丢弃的工件数量来提高产品产量。 ;解决方案:在设备中,通过对真空室内的电极施加高频电压来产生等离子体,从而进行等离子体处理。在该过程中,治疗期间电子部件的治疗磁滞由存储部71存储,并且如果由电源异常检测装置62检测到主电源61的异常,则向存储部71和电源供给电力。控制部70从作为备用电源的电池63,基于存储部71向控制部70传递停止了处理的电子部件的磁滞的处理,并继续进行电子部件的处理。恢复电源后的治疗滞后。因此,可以通过使用一种电子部件来提高产品的产量,该电子部件的处理方法已被中断并以常规方法丢弃。;版权所有:(C)1999,JPO

著录项

  • 公开/公告号JPH1154464A

    专利类型

  • 公开/公告日1999-02-26

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP19970202738

  • 发明设计人 HAJI HIROSHI;

    申请日1997-07-29

  • 分类号H01L21/304;B08B7/00;

  • 国家 JP

  • 入库时间 2022-08-22 02:33:33

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