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MANUFACTURE AND OF DEVICE OR MAGNETIC FILM, MAGNETIC THIN FILM INDUCTOR, MONOLITHIC MICROWAVE INTEGRATED CIRCUIT FIELD DUPLEXING CIRCUIT AND DEVICE
MANUFACTURE AND OF DEVICE OR MAGNETIC FILM, MAGNETIC THIN FILM INDUCTOR, MONOLITHIC MICROWAVE INTEGRATED CIRCUIT FIELD DUPLEXING CIRCUIT AND DEVICE
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机译:制造和设备或电磁膜,磁性薄膜感应器,单分子微波集成电路场双工电路和设备
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PROBLEM TO BE SOLVED: To make feasible of forming a magnetic film durable for high-frequency application, by finely dispersing insulating magnetic oxide phase into magnetic ally phase within the magnetic film. ;SOLUTION: Insulating magnetic oxide phase is finely dispersed into magnetic alloy mother phase within a magnetic film 13. At this time, the insulating magnetic oxide is to be made of at least a nickel oxide, an iron oxide and a zinc oxide while the composition when they are conveniently expressed in the three component ratio of Fe2O3, NiO and ZnO in chemical formulas, they are to be within the range i.e., 40 to 60 mol.% of Fe2O3, 10 to 30 mol.% of NiO and 20 to 40 mol.% of ZnO. In such a constitution, a magnetic film manufacturing device is to be provided with a functional part 2 forming insulating magnetic oxide phase by laser abrasion process in a single chamber 1 as well as another functional part 3 forming magnetic alloy mother phase by sputtering process. Besides, the atmospheric gas pressure in the film formation time of these functional parts 2, 3 is to be independently controlled.;COPYRIGHT: (C)1999,JPO
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机译:解决的问题:通过将绝缘的磁性氧化物相精细地分散在磁性膜内的磁性同质相中,使形成耐高频应用的磁性膜成为可能。 ;解决方案:将绝缘的磁性氧化物相精细地分散在磁性膜13内的磁性合金母相中。此时,绝缘的磁性氧化物应至少由氧化镍,氧化铁和氧化锌组成。当以化学式中的Fe 2 Sub> O 3 Sub>,NiO和ZnO的三组分比方便地表示时,它们应在40至60 mol的范围内Fe.Sub <2> Sub> O 3 Sub>。%,NiO 10至30 mol。%和ZnO 20至40 mol。%。在这种构造中,磁性膜制造装置将具有在单个腔室1中通过激光磨蚀工艺形成绝缘的磁性氧化物相的功能部件2,以及通过溅射工艺形成磁性合金母相的另一个功能部件3。此外,这些功能部件2、3在成膜时的气压应独立控制。; COPYRIGHT:(C)1999,JPO
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