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METHOD OF WRITING GRID FOR NON-LOCALIZING STITCH ERROR

机译:非局部针迹误差的写网格方法

摘要

PROBLEM TO BE SOLVED: To remove the adverse influence of stitch errors, by selecting the stepwise irradiation dose so that each of lattice elements in overlapped regions receives the same total dose when all fields are written. ;SOLUTION: A dose increases and then decreases stepwise by unit AU, starting from 1AU to 5AU and from 5AU to 1AU, respectively, over an n-th, (n+1)-th fields 11 and (n+2)-th field 11'. The step width at 5AU is twice that of other step, resulting in that the total dose per line over the entire length of the (n+1)-th field 11 is 6AU adjusted so as to slightly exceed the developable threshold dose. A half of each of two side fields at the field end is not overlapped with other field and hence the dose level is zero.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:要消除针迹误差的不利影响,可以通过选择逐步照射剂量,以便在写入所有场时重叠区域中的每个晶格元素都收到相同的总剂量。 ;解决方案:在第n个,第(n + 1)个域11和第(n + 2)个域中,剂量分别从1AU到5AU和从5AU到1AU逐渐增加然后逐渐减小单位AU。字段11'。在5AU处的步长是其他步骤的步长的两倍,导致在第(n + 1)场11的整个长度上每行的总剂量被调整为6AU,以便略微超过可显影的阈值剂量。场端的两个副场中的每一个的一半不与其他场重叠,因此剂量水平为零。;版权所有:(C)1999,JPO

著录项

  • 公开/公告号JPH1197345A

    专利类型

  • 公开/公告日1999-04-09

    原文格式PDF

  • 申请/专利权人 NORTHERN TELECOM LTD;

    申请/专利号JP19980157667

  • 发明设计人 SUTEIIBUN JIYON KUREMENTSU;

    申请日1998-06-05

  • 分类号H01L21/027;G02B6/13;G02B6/122;G03F7/20;G03F7/22;

  • 国家 JP

  • 入库时间 2022-08-22 02:30:39

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