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It finishes in the anodic oxidation Characteristic metal base substance and coat suffering stick manner and its product

机译:以阳极氧化结束的特征性金属基体和涂层受粘方式及其产品

摘要

New processes are disclosed for depositing metal coatings on substrates of anodisable metals, such as aluminium and its alloys, the coatings being applied directly on to a porous anodised layer that has been produced on the surface of the substrate. Pore-filling metal is first electrolytically deposited in the pores, the metal depositing initially on the bottom walls and the lower parts of the side walls; usually until the pores are from about 3 % to about 30 % filled. Metal deposition is then continued using an electroless process until the pores are filled to the desired extent, usually until a support coating has been applied over the entire anodised layer. Other metal coatings can then be applied over the support layer, either by electrolytic or electroless methods. Electroless coatings of considerable thickness (as much as 75 micrometres) can successfully be applied. The new products of such processes comprise a substrate of anodisable metal, having on a surface an anodised layer of thickness of about 0.5 to about 50 micrometres; the pores of the anodised layer have pore-filling metal electrolytically deposited therein, and pore-filling metal electroless deposited on the electrolytically deposited metal. The electroless metal may constitute the final layer or other layers may be deposited over it to give the final product. The interposed electrolytically deposited metal provides improved adhesion to the anodised material as compared to direct electroless deposited metal.
机译:公开了用于在诸如铝及其合金之类的可阳极化金属的基底上沉积金属涂层的新方法,该涂层被直接施加到已经在基底表面上产生的多孔阳极氧化层上。孔填充金属首先以电解方式沉积在孔中,金属最初沉积在底壁和侧壁的下部;然后沉积在孔壁中。通常直到孔被填充约3%至约30%。然后使用无电工艺继续金属沉积,直到孔被填充到所需程度,通常直到在整个阳极氧化层上施加了支撑涂层为止。然后可以通过电解或化学方法在支撑层上施加其他金属涂层。可以成功地应用相当大的厚度(高达75微米)的化学镀层。这种工艺的新产品包括一种可阳极氧化的金属基材,其表面上的阳极氧化层厚度约为0.5至50微米。阳极氧化层的孔中电解沉积有孔填充金属,无电沉积在电解沉积金属上的孔填充金属。化学金属可以构成最终层,或者可以在其上沉积其他层以得到最终产品。与直接化学沉积的金属相比,插入的电解沉积的金属可改善对阳极氧化材料的附着力。

著录项

  • 公开/公告号JP2945472B2

    专利类型

  • 公开/公告日1999-09-06

    原文格式PDF

  • 申请/专利权人 ARUKAN INTERN LTD;

    申请/专利号JP19900512095

  • 发明设计人 FUAAN DAN;

    申请日1990-09-05

  • 分类号C23C28/00;

  • 国家 JP

  • 入库时间 2022-08-22 02:30:17

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