Measuring method and device null of grain size of polycrystal

摘要

PURPOSE:To measure the grain size of Al crystals on line so as to select Al multi-layered wirings of poor electro-migration resistance of an LSI in a manu facturing process. CONSTITUTION:A wafer to which Al is sputtered is Keller-etched to make the boundaries of grains clear. An SEM image is obtained by an image input device. The image is displayed on the screen at 2. A diagonal line is drawn on the image at 3. A mark is automatically given at a crossing point of the diagonal line with the boundary of grains at 4. A measuring person views the image and manually corrects the mark. The distance between the crossing points of the boundaries of grains on the diagonal line is regarded as the grain size. The frequency distribution of logarithmic values of the grain size is calculated to obtain a median and a standard deviation and further a shape coefficient at 9.