首页>
外国专利>
Apparatus for continuously forming large-area functional deposited films by microwave plasma CVD
Apparatus for continuously forming large-area functional deposited films by microwave plasma CVD
展开▼
机译:通过微波等离子体CVD连续形成大面积功能沉积膜的设备
展开▼
页面导航
摘要
著录项
相似文献
摘要
An apparatus for continuously forming a functional deposited film on a continuously moving web member by microwave plasma CVD process, said apparatus comprises: a substantially enclosed columnar film-forming chamber having a curved circumferential wall formed by curving and projecting said web member as said web member is moving in the longitudinal direction by curved portion-forming means, said film-forming chamber having a film-forming space defined by a curved moving web member constituting said circumferential in which plasma is generated; at least a microwave applicator means capable of radiating a microwave energy in the direction of microwave to propagate, said microwave applicator means being mounted to said film forming chamber through one of the two side faces thereof such that part of said microwave applicator means is plunged into said film-forming space, at least said part of microwave applicator means having a dielectric exterior constituted by a dielectric material having a value of 2x10-2 or less in the product of the dielectric constant ( epsilon ) and the dielectric dissipation factor (tan delta ) with respect to the frequency of microwave used; means for evacuating said film-forming chamber; means for introducing a film-forming raw material gas into said film-forming chamber; and a temperature controlling means.
展开▼