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Microwave excited plasma central processing unit
Microwave excited plasma central processing unit
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机译:微波激发等离子体中央处理器
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摘要
PROBLEM TO BE SOLVED: To stabilize the output and the pressure of microwaves in a wide range and to generate the microwaves uniformly in a chamber by a method wherein two slits are formed in parallel with each other along the surface vertical to the electric field in the vicinity of the surface in parallel with the electric field direction of microwaves, and a narrow waveguide is provided on the opposite surface. SOLUTION: A rectangular waveguide 11, into which microwaves are introduced, has an H-surface which is in parallel with the field direction of the microwaves extending to the vertical direction against the H-surface, and reflection surface (short-circuit surface, R-surface) which reflects the microwaves, provided vertical to the H-surface and the E-surface on the opposite side of the microwave introducing side. Two slits of 121 and 122 are perforated on the H-surface in the vicinity of the H-surface along the E-surface. The slits 121 and 122 have the shape which is changed stepwise so that their width becomes narrower towards the reflection surface (R-surface).
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