The transparent substrate DP type glass substrate coated with at least one thin layer process for deposition of the thin layer and the application of the substrate or the process for the production of

摘要

The invention relates to a transparent substrate of the glass substrate covered with at least one thin layer of nitride or oxynitride silicium.selon the invention, the thin layer comprises the elements si, o, n, c in the following atomic percentage: si of 30 to 60%, in particular from 40 to 50%, n: from 10 to 56%, in particular of 20 to 56%, of: 1 to 40%, in particular from 5 to 30%, c: from 1 to 40%, in particular from 5 to 30 %. The present invention also relates to a process for its preparation, in particular by a technique of pyrolysis in gaseous phase and its applications.