A SUBSTRATE COATED WITH DIELECTRIC THIN-FILM LAYER, A GLAZING ASSEMBLY, A PROCESS FOR DEPOSITION ON A SUBSTRATE, AND AN INSTALLATION FOR DEPOSITION ON A SUBSTRATE

摘要

The present invention relates to a substrate 1 such as a glass substrate , which at least one dielectric thin layer and is coated with , a dielectric layer , for example, is backed by a magnetic field , preferably oxygen and / or by cathode sputtering in the presence of a reactive nitrogen , the ion source (4) at least one of the ion beam (3 coming from the ) is deposited and exposed to . The present invention , the dielectric layer exposed to the ion beam is characterized in that the crystallization .