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SINGLE-ELECTRON FLOATING-GATE MOS MEMORY

机译:单电子浮栅MOS存储器

摘要

A Single Electron MOS Memory (SEMM), in which one bit of information is represented by storing only one electron, has been demonstrated at room temperature. The SEMM is a floating gate Metal-Oxide-Semiconductor (MOS) transistor in silicon with a channel width (about 10 nanometers) which is smaller than the Debye screening length of a single electron stored on the floating gate (26), and a nonoscale polysilicon dot (about 7 nanometers by nanometers by 2 nanometers) as the floating gate which is positioned between the channel and the control gate (30). An electron stored on the floating gate (26) can screen the entire channel from the potential on the control gate, and lead to: (i) a discrete shift in the threshold voltage; (ii) a staircase relation between the charge voltage and the shift; and (iii) a self-limiting charge process. The structure and fabrication of the SEMM is well adapted to the manufacture of ultra large-scale integrated circuits.
机译:已经在室温下证明了单电子MOS存储器(SEMM),其中仅通过存储一个电子来表示一位信息。 SEMM是硅中的浮栅金属氧化物半导体(MOS)晶体管,其沟道宽度(约10纳米)小于存储在浮栅(26)上的单个电子的德拜屏蔽长度,并且为非标度多晶硅点(约7纳米乘2纳米)作为浮栅,位于沟道和控制栅(30)之间。存储在浮置栅极(26)上的电子可以将整个沟道与控制栅极上的电位隔离开来,并导致:(i)阈值电压发生离散偏移; (ii)充电电压与偏移之间的阶梯关系; (iii)自限收费程序。 SEMM的结构和制造非常适合于超大规模集成电路的制造。

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