首页>
外国专利>
TANTALUM AND NIOBIUM REAGENTS USEFUL IN CHEMICAL VAPOR DEPOSITION PROCESSES, AND PROCESS FOR DEPOSITING COATINGS USING THE SAME
TANTALUM AND NIOBIUM REAGENTS USEFUL IN CHEMICAL VAPOR DEPOSITION PROCESSES, AND PROCESS FOR DEPOSITING COATINGS USING THE SAME
展开▼
机译:化学蒸气沉积过程中常用的钽和铌增晶剂,以及使用相同方法沉积涂层的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formulaM(OR1)x(R2-C(GH)-C-C(G)-R3)ywherein M is tantalum or niobium; G is oxygen or sulfur; and R1, R2, and R3 are independently selected hydrocarbyl, fluoroalkyl or alkoxy groups.
展开▼