To replace electronic shaurers and their target / tube assemblies for ion implanters

摘要

A plasma enhanced electronic scaler 62 for the ion implantation system 10 is provided that includes an extension tube 66 having a replaceable graphite inner liner 88. The inner liner is biased to a low negative potential (-6V) such that the secondary electrons having low energy generated by the electron share target can continue to be used for wafer charge neutralization, Stop. The electrically biased inner surface is serrated in alternating surface 128 facing the wafer and surface 130 facing the target. During operation of the electronic grower 62, photoresist or other material that can be back sputtered from the wafer is collected on the surface 128 facing the wafer that is not conductive, while the surface (e.g., 130 are cleaned and become conductive. The surface facing the conductive target provides a shunt path (low resistance) to electrically ground the high energy electrons generated in the electron shar.