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Coating system especially for coating silicon wafers, particularly for plasma-enhanced CVD in solar cell production
Coating system especially for coating silicon wafers, particularly for plasma-enhanced CVD in solar cell production
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机译:特别是用于涂覆硅片的涂覆系统,尤其是用于太阳能电池生产中的等离子增强CVD的涂覆系统
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摘要
A flat object coating system has a piston (14, 16) for moving an object within a cylinder (10, 12) to a region where the object is transferred to a coating apparatus (40) or is removed. A flat object coating system has a piston (14, 16) which has an object receiver and which slides in an open-ended cylinder (10, 12) with sealed first and second regions. The first region is located at the cylinder end and has a length greater than the receiver width, while the second region is sealed against atmospheric pressure independently of the piston position. A transfer device (86) passes through a cylinder opening in the second region or an adjoining further region and through the piston receiver, when it is aligned with the opening, for transfer of the object to a coating apparatus (40) or for removal of the object. An Independent claim is also included for continuous coating of flat objects preferably by plasma-enhanced CVD (PECVD) using the above apparatus.
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