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Microwave ion source for ion implantation
Microwave ion source for ion implantation
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机译:用于离子注入的微波离子源
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摘要
A microwave energized ion source apparatus (12) is supported by a support tube (94) extending into a cavity (57) defined by a housing assembly (22) and includes a dielectric plasma chamber (42), a pair of vaporizers (44), a microwave tuning and transmission assembly (40) and a magnetic field generating assembly (46). The chamber (42) defines an interior region (50) into which source material and ionizable gas are routed. The chamber (42) is overlied by a cap (62) having an arc slit (64) through which generated ions exit the chamber (42). The microwave tuning and transmission assembly (40), which feeds microwave energy to the chamber (42) in the TEM mode, includes a coaxial microwave energy transmission line center conductor (54). One end (66) of the conductor (54) fits into a recessed portion (68) of the chamber (42) and transmits microwave energy to the chamber (42). The center conductor (54) extends through an evacuated portion of a coaxial tube (56) surrounding the conductor (54). A vacuum seal (58) is disposed in or adjacent the coaxial tube (56) and from the boundary between the evacuated coaxial tube (56) and a non-evacuated region. IMAGE
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