首页> 外国专利> Interconnection track connecting, at several levels of metallization, a grid isolee of a transistor has a diode discharge within a circuit integrated, and advantages of such a track

Interconnection track connecting, at several levels of metallization, a grid isolee of a transistor has a diode discharge within a circuit integrated, and advantages of such a track

机译:在多个金属化层连接晶体管的栅极隔离线的互连走线在集成的电路内具有二极管放电,这种走线的优点

摘要

The interconnection track (pcn) comprises a first element of the track (el1) extending in the metallization level of the highest, having a first end connected to the gate (g) and having a length (l1) greater than a predetermined critical length. This first element of the track comprises a portion of track interrupted (pp1) in a location emp) (at a distance from said first end of a first distance (l2) of less than the critical length and which is compatible with the layout of the metallization level of greater than, and extending between two insulating layers (is1 and is2) on a same metallization level (m1). The two branches (bp1, bp2) of said portion interrupted are mutually connected by a metal contact of the filling (ct1) also extending in the insulating layer of the support (is2) of the metallization level (m2) immediately greater than that (m1) containing the said portion of track interrupted.
机译:互连迹线(pcn)包括以最高金属化水平延伸的迹线(el1)的第一元件,其第一端连接到栅极(g),并且长度(l1)大于预定的临界长度。轨道的该第一元件包括在位置emp中中断的轨道的一部分(pp1)(与第一距离的所述第一端的距离小于临界长度的第一距离(l2),并且与轨道的布局兼容)。大于且在同一金属化层(m1)上的两个绝缘层(is1和is2)之间延伸的金属化层。中断部分的两个分支(bp1,bp2)通过填充物的金属触点(ct1)相互连接)也延伸到金属化层(m2)的支撑物(is2)的绝缘层中,该绝缘层立即大于包含所述被中断的轨道部分的绝缘层(m1)。

著录项

  • 公开/公告号FR2766013A1

    专利类型

  • 公开/公告日1999-01-15

    原文格式PDF

  • 申请/专利权人 STMICROELECTRONICS SA;

    申请/专利号FR19970008807

  • 发明设计人 JOSEPH BOREL;

    申请日1997-07-10

  • 分类号H01L23/522;

  • 国家 FR

  • 入库时间 2022-08-22 02:10:30

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