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Interconnection track connecting, at several levels of metallization, a grid isolee of a transistor has a diode discharge within a circuit integrated, and advantages of such a track
Interconnection track connecting, at several levels of metallization, a grid isolee of a transistor has a diode discharge within a circuit integrated, and advantages of such a track
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机译:在多个金属化层连接晶体管的栅极隔离线的互连走线在集成的电路内具有二极管放电,这种走线的优点
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摘要
The interconnection track (pcn) comprises a first element of the track (el1) extending in the metallization level of the highest, having a first end connected to the gate (g) and having a length (l1) greater than a predetermined critical length. This first element of the track comprises a portion of track interrupted (pp1) in a location emp) (at a distance from said first end of a first distance (l2) of less than the critical length and which is compatible with the layout of the metallization level of greater than, and extending between two insulating layers (is1 and is2) on a same metallization level (m1). The two branches (bp1, bp2) of said portion interrupted are mutually connected by a metal contact of the filling (ct1) also extending in the insulating layer of the support (is2) of the metallization level (m2) immediately greater than that (m1) containing the said portion of track interrupted.
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