FORMING METHOD OF ELECTROLESS Ni-P PLATING LAYER ON GLASS SUBSTRATE FOR MAGNETIC DISK

摘要

PROBLEM TO BE SOLVED: To omit a polishing process before a texturing process by successively subjecting the surface of a glass substrate to degreasing treatment, etching treatment, treatment with warm pure water, treatment with a silane coupling agent, activator treatment and accelerator treatment, and then subjecting to electroless Ni-P plating and to heat treating.;SOLUTION: The surface of a glass substrate is subjected to alkali degreasing treatment to remove contaminants and to acid etching to remove remaining oxide films. The purified glass substrate surface is treated with warm pure water at about ≥90°C to newly form an oxide film, and then treated with, for example, an amino-based silane coupling agent. Then the surface is subjected to activation (activator treatment) with, for example, a palladium chloride aq. soln., further subjected to reaction acceleration treatment (accelerator treatment) with, for example, a sodium hypophosphite aq. soln., then subjected to electroless Ni-P plating to form a Ni-P plating layer, and then subjected to specified heat treatment.;COPYRIGHT: (C)2000,JPO