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PREPARATION OF HIGHGLY HYDROPHILIC LAYER, AND HIGHLY HYDROPHILIC LAYER

机译:高亲水层和高亲水层的制备

摘要

PROBLEM TO BE SOLVED: To impart both water resistance and hydrophilicity each at a high level to a hydrophilic layer by firstly forming a hydrophilic layer containing alumina particles and secondly treating this hydrophilic layer with a liquid containing silicic acid.;SOLUTION: As an alumina particle for a hydrophilic layer formed first, any kind of alumina, provided that one or more than one of aluminum oxide hydrate and aluminum hydroxide forms 20-100 wt.% of the total alumina can be used. Preferably, 20-100 wt.% of the alumina particles are sol having an average particle size of not more than 200 nm. Alumina can solely give a hydrophilic layer, but preferably it is used together with other inorganic fillers, sol or the like so that it is contained in an amount of 5-90 wt.% in the hydrophilic layer. A liquid containing silicic acid for a second step is one containing a silicate salt or silicic acid. The increase in the amount of silicic acid in the hydrophilic layer after the treatment with the liquid containing silicic acid is preferably 5-5,000 mg/m2.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:首先通过形成包含氧化铝颗粒的亲水层,然后再用包含硅酸的液体处理该亲水层,使亲水层具有高水平的耐水性和亲水性;解决方案:作为氧化铝颗粒对于首先形成的亲水层,可以使用任何种类的氧化铝,只要可以使用氧化铝水合物和氢氧化铝中的一种或多种形成氧化铝总量的20-100重量%即可。优选地,20-100重量%的氧化铝颗粒是平均粒径不大于200nm的溶胶。氧化铝可以单独提供亲水层,但是优选将其与其他无机填料,溶胶等一起使用,以使亲水层中氧化铝的含量为5-90重量%。用于第二步骤的包含硅酸的液体是包含硅酸盐或硅酸的液体。用含硅酸的液体处理后,亲水层中硅酸的增加量优选为5-5,000 mg / m2 。;版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP2000169758A

    专利类型

  • 公开/公告日2000-06-20

    原文格式PDF

  • 申请/专利权人 KONICA CORP;

    申请/专利号JP19980368502

  • 发明设计人 NISHIO KAZUYUKI;

    申请日1998-12-09

  • 分类号C09D5/00;B01J20/00;B05D5/04;B41C1/00;B41M5/00;B41N1/14;B41N3/03;C09D1/00;

  • 国家 JP

  • 入库时间 2022-08-22 02:01:53

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