OXYGEN-CUTOFF FILM MATERIAL FOR FORMATION OF PATTERN AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an oxygen-cutoff film material which enables easy control of sensitivity of a radical polymn.-type photosensitive resin layer, and to provide a method to form a high definition pattern.;SOLUTION: This oxygen-cutoff film material contains at least a water-soluble resin having oxygen-cutoff property and a light-absorbing agent having a light-absorbing wavelength region which at least partly overlaps with the light-absorbing wavelength region of the polymn. initiator included in photosensitive resin layer 2. An oxygen-cutoff film 3 consisting of the oxygen-cutoff film material for pattern forming above described is formed on the photosensitive resin layer 2 containing at least radical polymerizable monomers and a polyms. initiator. The amt. of radicals produced in the photosensitive resin layer 2 is controlled by controlling the kind and amt. of the light-absorbing agent included in the oxygen-cutoff film 3 so as to obtain desired sensitivity. Then, in this state, the photosensitive resin layer 2 is exposed according to a specified pattern through the oxygen-cutoff film 3, and then developed to form the pattern.;COPYRIGHT: (C)2000,JPO