首页> 外国专利> PHOTOCATALYTIC CORRUGATED STRUCTURE AND PHOTOCATALYTIC DEODORIZATION MEMBER AND PHOTOCATALYTIC DEODORIZATION UNIT USING THE SAME

PHOTOCATALYTIC CORRUGATED STRUCTURE AND PHOTOCATALYTIC DEODORIZATION MEMBER AND PHOTOCATALYTIC DEODORIZATION UNIT USING THE SAME

机译:光催化波状结构,光催化脱氧构件和使用该装置的光催化脱氧装置

摘要

PROBLEM TO BE SOLVED: To ensure durability as well as to effectively remove malodorous components by using the face of an adsorption decomposition sheet with an adsorption layer as an adhesive face in a corrugated structure. SOLUTION: An adsorption decomposition sheet 1 having a structure obtained by disposing an adsorption layer 3 containing an adsorbent on one face of a flexible photocatalytic substrate 2 containing a photoreactive semiconductor is used as the core sheet 5 or the liner 4 of a photocatalytic corrugated structure. The face of the adsorption decomposition sheet 1 with the adsorption layer 3 is used as an adhesive face in the photocatalytic corrugated structure. The contact of an adhesive with the photoreactive semiconductor in the photocatalytic substrate 2 can be suppressed by the barrier effect of the adsorption layer 3 and the resultant photocatalytic corrugated structure is excellent in durability while maintaining the photocatalytic action of the photoreactive semiconductor by which malodorous components are decomposed and removed.
机译:要解决的问题:在波纹结构中,将带有吸附层的吸附分解片材的表面用作粘合面,以确保耐用性并有效去除恶臭成分。解决方案:具有结构的吸附分解片材1是通过在包含光反应性半导体的柔性光催化基材2的一个面上设置包含吸附剂的吸附层3制成的,用作光催化波纹结构的芯板5或衬板4。吸附分解片材1的具有吸附层3的面在光催化波纹结构中用作粘合面。可以通过吸附层3的阻挡作用来抑制粘合剂与光催化性半导体2中的光反应性半导体的接触,并且所得到的光催化性波纹状结构在维持恶臭成分为特征的光反应性半导体的光催化作用的同时,耐久性优异。分解并去除。

著录项

  • 公开/公告号JP2000126609A

    专利类型

  • 公开/公告日2000-05-09

    原文格式PDF

  • 申请/专利权人 MITSUBISHI PAPER MILLS LTD;

    申请/专利号JP19980307052

  • 发明设计人 OGAMI KATSUSHI;HIOKI SHINYA;

    申请日1998-10-28

  • 分类号B01J35/02;A61L9/20;B01D53/86;B01J35/04;B01J35/06;

  • 国家 JP

  • 入库时间 2022-08-22 01:58:30

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