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BLACK DEFECT CORRECTION METHOD AND BLACK DEFECT CORRECTION DEVICE FOR PHOTOMASK
BLACK DEFECT CORRECTION METHOD AND BLACK DEFECT CORRECTION DEVICE FOR PHOTOMASK
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机译:用于光掩膜的黑缺陷校正方法和黑缺陷校正装置
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摘要
When a dot matrix whose one dot corresponds to the spot of an ion beam on a treated surface is set on the treated surface and an ion beam is applied to each dot in a treatment region for a certain time to eliminate a black defect, the existence of secondary charged particles, which are emitted from a plurality of dots including a dot in question and dots around the dot and indicate the existence of the black defect, is detected and, in accordance with those detection information, a physical value corresponding to the existence of the black defect is calculated. When the calculated value is reduced to a value not larger than a reference value, it is judged that the treatment of the dot in question has been finished.
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