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METHOD OF MANUFACTURING A RADIATION HARDENED SEMICONDUCTOR DEVICE HAVING ACTIVE REGIONS AND ISOLATION REGIONS
METHOD OF MANUFACTURING A RADIATION HARDENED SEMICONDUCTOR DEVICE HAVING ACTIVE REGIONS AND ISOLATION REGIONS
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机译:具有有源区和隔离区的辐射受阻半导体器件的制造方法
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摘要
A method for manufacturing a radiation hardened semiconductor device, having defined active region and isolation region. The isolation region containing an isolation material and active region containing a transition region between active and isolation region, sometimes denoted a bird's beak region. Wherein the transition region is doped with germanium and boron, to prevent formation of leakage paths between active devices, or whithin an active device. The doped area can be further limited to that area of the transition region that is adapted to be covered by a gate material, such as polysilicon.
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