首页> 外国专利> PREPARATION OF COPPER-INDIUM-GALLIUM-DISELENIDE PRECURSOR FILMS BY ELECTRODEPOSITION FOR FABRICATING HIGH EFFICIENCY SOLAR CELLS

PREPARATION OF COPPER-INDIUM-GALLIUM-DISELENIDE PRECURSOR FILMS BY ELECTRODEPOSITION FOR FABRICATING HIGH EFFICIENCY SOLAR CELLS

机译:电沉积制备高效率太阳能电池铜铟镓二硒化物前驱膜

摘要

A photovoltaic cell (10) exhibiting an overall conversion efficiency of 13.6 % is prepared from a copper-indium-gallium-diselenide precursor film (18). The film (18) is fabricated by first simultaneously electrodepositing copper, indium, gallium and selenium onto a glass/molybdenum substrate (12/14). The electrodeposition voltage is a high frequency AC voltage superimposed upon a DC voltage to improve the morphology and growth rate of the film (18). The electrodeposition is followed by physical vapor deposition to adjust the final stoichiometry of the thin film (18) to approximately Cu(In1-x,Gax)Se2, with the ratio of Ga/(In+Ga) being approximately 0.39.
机译:由铜-铟-镓-二硒化物前体膜(18)制备总转化效率为13.6%的光伏电池(10)。通过首先将铜,铟,镓和硒同时电沉积到玻璃/钼基板(12/14)上来制造薄膜(18)。电沉积电压是叠加在DC电压上以改善膜(18)的形态和生长速率的高频AC电压。电沉积之后进行物理气相沉积,以将薄膜(18)的最终化学计量调整为大约Cu(In1-x,Gax)Se2,Ga /(In + Ga)之比大约为0.39。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号