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Preparation of pure stereoisomers of new or known substituted pyrrolidine or piperidine derivatives, used e.g. as components of chiral catalysts, alkaloids or drugs

机译:新的或已知的取代的吡咯烷或哌啶衍生物的纯立体异构体的制备,例如用于作为手性催化剂,生物碱或药物的成分

摘要

Stereochemically controlled preparation of highly substituted aza-cyclic compounds (I) involves reaction of metallized 2-alkenylsulfoximide compounds with N-protected alpha - or beta -aminoaldehydes, cyclization of the product and cleavage of the sulfonimidoyl-alkyl bond. Some products and intermediates are new compounds. Stereochemically controlled preparation of pyrrolidine or piperidine derivatives of formula (I) or their acid addition salts or protected derivatives comprises: (a) reacting a 2-alkenylsulfoximine of formula (II) successively with a base suitable for deprotonation, an organometallic reagent of formula XM2(OR12)3 (VII) and a stereoisomer of an amino-aldehyde of formula (VIII), to give a stereoisomer of a sulfoxime of formula (IX); (b) cleaving R13 to give an azacyclic substituted sulfoximine compound of formula (Xa), blocking the ring N with a base-stable protective group if R901 = H and cleaving a silyl protective group R11 if still present; (c) preparing (I; Y = O; R8 = R801; R9 = R902) (IA) by either: (c1) reductively cleaving the sulfonylimidoyl-alkyl bond of (Xa) (or a compound obtained by cleaving the silyl protective group R11) to give (I; Y = O; R8 = R801; R9 = R902; R1 = R101; R2 = H)) (IB); or (c2) after electrophilic activation of the sulfonimidoyl unit, cleaving the sulfonylimidoyl-alkyl bond of (Xa; R101 other than H) by base-induced elimination to give (I; Y = O; R8 = R801; R9 = R902; CHR1R2 = -CH=CHR102) (IC); and optionally (d) further converting (IA) by one or more of: Reaction (one or more times, each with inversion of configuration) with a reagent suitable for regenerating OH or forming NH2 in the 3-position; deprotection; alkylation or protection of the ring N; salification; and desalification. n = 0 or 1; R1 = H, 1-6C alkyl or Ph'-A-; Ph' = phenyl (optionally substituted by one or more of A' and OA'); A = lower alkyl; A' = A or lower haloalkyl R2, R3, R6, R7 = H; R4 = H, A or Ph'-A-; or R1 + R2 = =CH2 (optionally substituted by 1-5C alkyl, itself optionally substituted by Ph'); or R3+R4 = CH2CH2; or 3-6C alkylene (optionally containing 1-3 double bonds and optionally over-bridged by 1-2C alkylene (optionally substituted by 1 or 2 A)); R5 = H, A, OH, OA, Ph'-A- or Ph'-A-O-; R8 = H, CN, COOH (optionally esterified), CONH2 (optionally mono- or di-N-substituted), R'8 or 1-12C alkyl (optionally containing one or more of unsaturated bonds and/or substituents selected from halo, OH, OA, COOH (optionally esterified), CN, SH, SA, NH2, NHA, CONH2 (optionally mono- or di-N-substituted) and R'8); R'8 = 3-10C mono- or bicyclic ring system (optionally containing one or more of unsaturated bonds, ring O, N and/or S atoms and/or substituents selected from A', OA, OH, halo and Q); Q = lower alkylenedioxy bonded to two adjacent C; or R5 + R8 = group completing a 5-10C mono- or bicyclic ring system (optionally containing 1-3 unsaturated bonds, one or more ring O, N and/or S atoms and/or one or more substituents selected from A', OA', OH, halo and Q); or R6 + R7 = bond; and R5 + R8 = fused benzene ring (optionally: fused with a further 2-4C group to form an 8-10C bicyclic ring system containing 3-5 double bonds; containing one or more ring O, S and/or N atoms; and/or substituted by one or more of A' OA', OH, halo and Q); R9 = H, A, Ph'-A-O- or amino protecting group; or R8 + R9 = 3-4C alkylene; Y = O or NH; R101 = as R1 but excluding optionally substituted CH2; Ar = Ph (optionally substituted by one or more A); R10 = A, Ph (optionally monosubstituted by A or protected OH) or Ph-A- (optionally monosubstitituted by A in the ring); R1101 = silyl protecting group; X = halo; M2 = tetravalent transition met al; R12 = A, Ph or Ph-A-; R801 = as R8 but with reactive groups blocked by base-stable protecting groups; R901 = H; or R801 + R901 = 3-4C alkylene; R13 = amino protecting group; R11 = H or silyl protecting group; R902 = base-stable protecting group; or R902 + R801 = 3-4C alkylene; R102 = 1-5C alkyl or Ph'-(1-5C) alkylene. Independent claims are included for : (i) (IA) (including derivatives obtained by cleaving a protective group R801 or R901) as new compounds, provided that the 5-(CHR1R2) and 3-OH group are in the trans-configuration and the 4-(R4) group and 3-OH group are in the cis-configuration; (ii) (IB) as new compounds; (iii) intermediates (Xa) (including derivatives obtained by cleaving protective groups) as new compounds, provided that the 5-substituent and 3-OH group are in the trans-configuration and the 4-(R4) group and 3-OH group are in the cis-configuration; (iv) the use of samarium (II) iodide for the reductive desulfurization of (Xa); and (v) the use of the following in the stereochemically controlled preparation of aza-cyclic compounds: (R(S))-4(S)-isopropyl-2-p-toluoyl-4,5-dihydro-(1,2 lambda 6,3) oxathiazole-2-oxide or the corresponding (S(S))-4(S)-, (R(S))-4(R)- or (S(S))-4(R)- compound; or (S(S),N(1S))-N-(1-((tert. butyldimethylsilyl)oxy)methyl)-2-methylpropyl)-S-methyl-S-(4-methylphe nyl)-sulfoximide (sic) or the corresponding (S(S),N(1R))-compound.
机译:立体化学控制的高度取代的氮杂-环化合物的制备(I)涉及金属化的2-链烯基磺酰亚胺化合物与N-保护的α-或β-氨基醛的反应,产物的环化和磺酰亚胺基-烷基键的断裂。一些产品和中间体是新化合物。立体化学控制的式(I)的吡咯烷或哌啶衍生物或其酸加成盐或受保护的衍生物的制备包括:(a)使式(II)的2-链烯基亚砜亚胺与适合去质子化的碱连续反应,式XM2 (OR12)3(VII)和式(VIII)的氨基醛的立体异构体,得到式(IX)的磺肟的立体异构体; (b)裂开R13以得到式(Xa)的氮杂环取代的亚砜亚胺化合物,如果R901 = H,则用碱稳定的保护基封闭环N,如果仍然存在,裂开甲硅烷基保护基R11; (c)通过以下方法之一制备(I; Y = O; R8 = R801; R9 = R902)(IA)(c1)还原性裂解(Xa)的磺酰亚胺基-烷基键(或通过裂解甲硅烷基保护基获得的化合物) R11)给出(I; Y = O; R8 = R801; R9 = R902; R1 = R101; R2 = H))(IB);或(c2)磺酰亚胺基单元的亲电活化后,通过碱诱导的消除作用裂解(Xa; R101而不是H)的磺酰亚胺基-烷基键,得到(I; Y = O; R8 = R801; R9 = R902; CHR1R2 = -CH = CHR102)(IC);以及任选地(d)通过以下一种或多种进一步转化(IA):与适于在3位再生OH或形成NH 2的试剂反应(一次或多次,每次具有构型反转);脱保护N环的烷基化或保护;盐化和脱盐。 n = 0或1; R1 = H,1-6C烷基或Ph'-A-; Ph′=苯基(任选地被A′和OA′中的一个或多个取代); A =低级烷基; A′= A或低级卤代烷基R2,R3,R6,R7 = H; R4 = H,A或Ph′-A-;或R 1 + R 2 = CH 2(任选被1-5C烷基取代,其本身任选被Ph'取代);或或R3 + R4 = CH2CH2;或3-6C亚烷基(可选地包含1-3个双键,并可选地被1-2C亚烷基过桥(可选地被1或2 A取代)); R5 = H,A,OH,OA,Ph′-A-或Ph′-A-O-; R8 = H,CN,COOH(任选被酯化),CONH2(任选被单或双N-取代),R'8或1-12C烷基(任选包含一个或多个不饱和键和/或选自卤素的取代基, OH,OA,COOH(可选被酯化),CN,SH,SA,NH2,NHA,CONH2(可选被单或双N-取代的)和R'8); R′8 = 3-10C单环或双环系统(任选地包含一个或多个不饱和键,环O,N和/或S原子和/或选自A′,OA,OH,卤素和Q的取代基); Q =与两个相邻的C键合的低级亚烷基二氧基;或R5 + R8 =完成5-10C单环或双环系统的基团(可选地包含1-3个不饱和键,一个或多个环O,N和/或S原子和/或一个或多个选自A'的取代基, OA',OH,卤素和Q);或R6 + R7 =键; R5 + R8 =稠合苯环(任选地:与另外的2-4C基团稠合以形成含有3-5个双键;含有一个或多个O,S和/或N原子的8-10C双环系统;和/或被A'OA',OH,卤素和Q中的一个或多个取代; R9 = H,A,Ph′-A-O-或氨基保护基;或R 8 + R 9 = 3-4C亚烷基;或Y = O或NH; R101 =与R1相同,但不包括任选取代的CH2; Ar = Ph(可选地被一个或多个A取代); R10 = A,Ph(任选地被A或被保护的OH单取代)或Ph-A-(任选地在环中被A单取代); R1101 =甲硅烷基保护基; X =晕; M2 =四价过渡金属; R12 = A,Ph或Ph-A-; R801 =与R8相同,但反应性基团被碱稳定的保护基团所阻断; R901 = H;或R801 + R901 = 3-4C亚烷基; R13 =氨基保护基; R11 = H或甲硅烷基保护基; R902 =碱稳定的保护基;或R902 + R801 = 3-4C亚烷基; R102 = 1-5C烷基或Ph′-(1-5C)亚烷基。包括以下独立权利要求:(i)(IA)(包括通过裂解保护基R801或R901获得的衍生物)作为新化合物,条件是5-(CHR1R2)和3-OH基处于反式构型且4-(R4)基团和3-OH基团为顺式构型; (ii)(IB)作为新化合物; (iii)中间体(Xa)(包括通过裂解保护基获得的衍生物)作为新化合物,条件是5-取代基和3-OH基团处于反式构型并且4-(R4)基团和3-OH基团处于顺式构型; (iv)使用碘化sa(II)还原(Xa)的脱硫; (v)在立体化学控制的氮杂环状化合物的制备中的使用:(R(S))-4(S)-异丙基-2-对甲苯甲酰-4,5-二氢-(1,2 λ6,3)氧杂噻唑-2-氧化物或相应的(S(S))-4(S)-,(R(S))-4(R)-或(S(S))-4(R)-化合物;或(S(S),N(1S))-N-(1-((叔丁基二甲基甲硅烷基)氧基)甲基)-2-甲基丙基)-S-甲基-S-(4-甲基苯基)-磺酰亚胺)或相应的(S(S),N(1R))-化合物。

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