首页> 外国专利> Particle-optical imaging system for lithographical purposes has lens arrangement with ring pre-electrode facing mask holder to form grid lens having negative refractive index with mask foil

Particle-optical imaging system for lithographical purposes has lens arrangement with ring pre-electrode facing mask holder to form grid lens having negative refractive index with mask foil

机译:用于光刻的粒子光学成像系统具有透镜结构,该透镜结构具有面向环形预电极的掩模支架,以与掩模箔形成具有负折射率的栅格透镜

摘要

Imaging system has illumination system (QL), mask holder (MH) and projection system arranged along an optical axis. One optical system has a ring electrode and different electrostatic potentials are applied to the ring electrode and mask foil (MF) acting as grid electrode, together forming grid lens with negative refractive index. First lens arrangement (BS) has a ring pre-electrode (VE) on the side facing the mask holder at a different electrical potential from the mask foil to form a grid lens with negative refractive index with the mask foil.
机译:成像系统具有沿光轴排列的照明系统(QL),光罩支架(MH)和投影系统。一种光学系统具有环形电极,并且将不同的静电势施加到环形电极和用作栅格电极的掩模箔(MF),一起形成具有负折射率的栅格透镜。第一透镜装置(BS)在面对掩模保持器的一侧上具有与掩模箔不同的电势的环形预电极(VE),以与掩模箔形成具有负折射率的栅格透镜。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号