Caromium-tantalum oxides (Cr-TaO.sub.x), sputtering targets and thin film seedlayer/sublayers for thin film magnetic recording media

摘要

Chromium-tantalum oxides (Cr-TaO.sub.x), including chromium- tantalum pentoxide (Cr-Ta.sub.2 O.sub.5), chromium-tantalum tetrioxide (Cr-Ta.sub. 2 O.sub.4 or Cr-TaO.sub.2), sputtering targets containing them, and their manufacture are disclosed. The targets are characterized by high density, uniform TaO.sub.x distribution, low impedance and stable plasma during the sputtering. The Cr-Ta oxides are used as a thin film sublayer to improve the coercivity and other characteristics of magnetic recording media deposited on metallic or non-metallic substrates used in hard disks for data storage.