Electrolyte for the galvanic deposition of low-stress, crack- resistant ruthenium layers

摘要

An electrolyte for the galvanic deposition of stress-relieved, crack- resistant ruthenium layers containing ruthenium in complexed form. The additive for the electrolyte is pyridine or an N-alkylated pyridinium salts of formula I ##STR1## wherein R.sup.⊖ is --(CH. sub.2).sub. 3 --SO.sub.3.sup.⊖, --CH.sub.2 --CHOH--CH.sub.2 --SO. sub.3.sup.. crclbar., or ##STR2## R' and H is, alkyl with 1-6 C atoms, -- CH═CH. sub.2, or --CO.sub.2 Na.