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Gas arrival time delay cancellation manner and gas arrival time delay cancellation device and vapor phase epitaxially grown device

机译:气体到达时间延迟消除方式,气体到达时间延迟消除装置及气相外延生长装置

摘要

PROBLEM TO BE SOLVED: To dissolve an arrival time lag of a gas when pipelines connected to different groups have different lengths, by calculating the arriving time legs of the gas among the plural respective groups caused by the different lengths of the pipelines, and successively opening and closing each valve based on the time legs. ;SOLUTION: A metal organic vapor phase epitaxial growth system is provided with a pipeline for ING carrier gas, through which a plurality of gaseous starting material 1-n and counter gases 1-n are supplied to a reaction furnace and an exhaust pipeline for VENT carrier gas. A device for dissolving the arrival time lags of the gases controls the switching operations among gaseous starting materials 1-n and counter gases 1-n by opening and closing valves 1A-1D and nA-nD. At controlling of the switching operations, the arrival time lags of the gases among the groups are calculated based on the lengths, diameters, flow rates, etc., of pipelines for each group of the gaseous starting materials 1-n, and all of the gaseous starting materials 1-n are made to arrive at a reaction furnace simultaneously, by automatically successively opening and closing each of the valves 1A-1D and nA-nD in accordance with the time legs.;COPYRIGHT: (C)1999,JPO
机译:要解决的问题:通过计算由不同长度的管道引起的各个组之间的气体到达时间段,并依次打开,以解决连接到不同组的管道长度不同时气体到达的时间滞后问题然后根据时间段关闭每个阀门。 ;解决方案:金属有机气相外延生长系统设有用于ING载气的管线,通过该管线,将多种气态原料1-n和反向气体1-n供入反应炉和用于VENT的排气管线载气。用于解决气体到达时间滞后的装置通过打开和关闭阀1A-1D和nA-nD来控制气态原料1-n和反向气体1-n之间的切换操作。在控制切换操作时,基于每组气态原料1-n的管道的长度,直径,流速等,计算各组中气体的到达时间滞后,并且所有使气态原料1-n同时到达反应炉,方法是根据时间段自动依次依次打开和关闭每个阀门1A-1D和nA-nD。版权所有:(C)1999,JPO

著录项

  • 公开/公告号JP3178396B2

    专利类型

  • 公开/公告日2001-06-18

    原文格式PDF

  • 申请/专利权人 日本電気株式会社;

    申请/专利号JP19970329706

  • 发明设计人 長谷川 功一;

    申请日1997-11-14

  • 分类号H01L21/205;C23C16/455;

  • 国家 JP

  • 入库时间 2022-08-22 01:34:38

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