EXPOSURE SYSTEM, METHOD FOR REPLACING GAS, METHOD OF MANUFACTURING DEVICE, SEMICONDUCTOR MANUFACTURING PLANT, AND MAINTENANCE METHOD

摘要

PROBLEM TO BE SOLVED: To quickly lower the concentration of the gas in a chamber at the beginning. ;SOLUTION: An exposure system is provided with a chamber surrounding a prescribed space, a first supply device that supplies a first gas into the chamber, and a second supply device that supplies a second gas different from the first gas into the chamber. The system is also provided with a switch mechanism which supplies either one of the gases into the chamber by switching the first and second supply devices to each other. Consequently, the stagnating gas replaced conventionally by molecular diffusion only can be replaced quickly.;COPYRIGHT: (C)2001,JPO