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Grain size control manner of temporary chamotte body for semiconductor porcelain and production manner null of semiconductor

机译:半导体瓷临时护手体的粒度控制方式及半导体的生产方式

摘要

PROBLEM TO BE SOLVED: To control the matrix grain diameter of semiconductor porcelain by adding a valence controlling agent to powdery ceramic stock and calcining them so that the average particle diameter of the resultant calcined powder is regulated to a specified value. SOLUTION: Powdery SrTiO3 stock is, e.g. used as powdery semiconductor ceramic stock and a Y or Nb compd. is used as a valence controlling agent. When the Y compd. is used, it is added by 0.05-3.0mol% (expressed in terms of Y2 O3 ) of the amt. of the SrTiO3 stock. When the Nb compd. is used, it is added by 0.01-3.0mol% (expressed in terms of Nb2 O5 ) of the amt. of the SrTiO3 stock. The matrix grain diameter of the objective semiconductor porcelain is controlled by regulating the average particle diameter of calcined powder to 0.5-3μm calculated by an air permeation method. The particle diameter is regulated to 0.5-3μm by regulating calcining temp. to 950-1,300 deg.C and the ratio of (Sr, Y) to Ti or the ratio of Sr to (Ti, Nb) to 0.993-0.999.
机译:解决的问题:通过向粉状陶瓷原料中添加价态控制剂并进行煅烧来控制半导体瓷器的基体粒径,以便将所得煅烧粉末的平均粒径调节至指定值。解决方案:例如,粉状SrTiO3原料为用作粉末状半导体陶瓷原料,并含有Y或Nb。用作价控制剂。当Y压缩时。使用AMT时,其添加量为0.05-3.0mol%(以Y 2 O 3表示)。 SrTiO3库存。当Nb压缩时。如果使用AMT,则其添加量为0.01-3.0mol%(以Nb2 O5表示)。 SrTiO3库存。通过将煅烧粉末的平均粒径调节至通过空气渗透法计算的0.5-3μm,来控制目标半导体瓷的基体粒径。通过调节煅烧温度将粒径调节到0.5-3μm。到950-1,300℃,(Sr,Y)与Ti之比或Sr与(Ti,Nb)之比为0.993-0.999。

著录项

  • 公开/公告号JP3125263B2

    专利类型

  • 公开/公告日2001-01-15

    原文格式PDF

  • 申请/专利权人 太陽誘電株式会社;

    申请/专利号JP19950311665

  • 发明设计人 田中 喜佳;神津 典之;

    申请日1995-11-07

  • 分类号C04B35/495;C04B35/46;H01B3/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:33:50

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