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Measuring method null of grating constant of piezoelectric

机译:压电光栅常数的测量方法

摘要

PURPOSE: To prevent the accurate measurement of lattice constants from being hindered by coating the whole surface of a piezoelectric crystal, whose lattice constants are to be measured, with a conductive thin film. ;CONSTITUTION: A wafer 1 is made from electro-optical material used for optical devices, and the thickness thereof is d. A conductive thin film 2 is made from conductive material, whose surface, back face and whole side face are coated so as to form the thin film being t in thickness. Since lattice constants are obtained through the thin film 2 by means of X-radiation analysis, the thickness is not allowed to be so thick as to produce the crystal of the thin film. The material is to absorb little X-radiation as its characteristic. From the viewpoint of optical devices manufacturing, the material is required to disappear by oxidation, or to be removed by acid or alkali. Carbon is most suitable as the thin film, and gold, silver, or organic substance having conductivity are also available as the thin film. The thin film thickness stays normally in a range from several tens to several hundreds angstroms. The purpose of the thin film is to let charge escape, and the thin film is allowed to be studded as islets-like on the surface thereof.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:为防止通过在压电晶体的整个表面上涂覆导电薄膜来覆盖晶格常数的精确测量,压电晶体的晶格常数将被测量。 ;组成:晶片1由用于光学装置的电光材料制成,其厚度为d。导电薄膜2由导电材料制成,其表面,背面和整个侧面被涂覆以形成厚度为t的薄膜。由于借助于X射线分析通过​​薄膜2获得晶格常数,因此厚度不能太厚而不能产生薄膜的晶体。该材料以吸收很少的X射线为特征。从光学器件制造的观点来看,要求该材料通过氧化而消失,或者需要通过酸或碱去除。碳最适合作为薄膜,并且具有导电性的金,银或有机物质也可用作薄膜。薄膜厚度通常保持在几十到几百埃的范围内。薄膜的目的是让电荷逸出,并允许薄膜散布成胰岛状。[版权] :( C)1993,日本特许厅&日本apio

著录项

  • 公开/公告号JP3157248B2

    专利类型

  • 公开/公告日2001-04-16

    原文格式PDF

  • 申请/专利权人 日本メクトロン株式会社;

    申请/专利号JP19920036638

  • 发明设计人 永 堀 淳 司;冨 長 英 樹;

    申请日1992-02-24

  • 分类号G01N23/20;G01N1/28;

  • 国家 JP

  • 入库时间 2022-08-22 01:33:26

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