METHOD FOR SYNTHESIZING THIN LiMn2O4 FILM, PRODUCTION OF LITHIUM CELL AND SPUTTERING APPARATUS

摘要

PROBLEM TO BE SOLVED: To easily obtain a thin LiMn2O4 film as the positive electrode material of a lithium call by successively vapor-depositing -manganese dioxide, lithium and -manganese dioxide by continuous reactive sputtering using dimanganese trioxide and lithium targets. SOLUTION: A substrate 4 is put on a tray 2 with a rotating mechanism for moving the substrate 4 to a position above a target in a vacuum vessel 1 in such a way that the substrate 4 closes up a slit 3 in the tray 2. The vacuum vessel 1 is evacuated, e.g. to 110-6 Torr by a cryopump through a valve, this valve is closed once and 10SCCM gaseous argon and 2SCCM gaseous oxygen are introduced. A sputtering source is ignited, the degree of vacuum is raised to 0.05 Torr and a dimanganese trioxide target 5a, a lithium target 5b put in a stainless Petridish 13 and the dimanganese trioxide target 5a are subjected to successive RF sputtering at =400 deg.C while moving the substrate 4 to obtain the objective thin LiMn2O4 film.