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JUDGMENT OF REPLACEMENT TIMING OF RETAINING RING USED IN SUBSTRATE POLISHING WORK

机译:基质抛光工作中固定环的更换时间判断

摘要

PROBLEM TO BE SOLVED: To judge the replacement timing of a retainer ring used in a substrate polishing work by providing a wear marker exposed so as to come into contact with an abrasive surface during the polishing of a substrate to show a preliminarily selected quantity of the wear of the bottom surface.;SOLUTION: A retaining ring 22 comprises a bottom (or wear) layer 34 and an upper (or support) layer 36. A wear marker 38 has a visual indicator arranged on the outside surface of the retaining ring 22. This visual indicator is subjected to a visual inspection while a substrate is polished. The wear marker 38 is formed of the color change between the bottom layer 34 and the upper layer 36. These layers are formed of different material compositions. The bottom layer 34 is formed of a material such as 'TEFLON(R)' base material contactable with the abrasive pad of an abrasive pad without having a bad influence (for example, 'ZYMAXX(R)' forming material available form DuPont).;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:通过提供暴露的磨损标记以在基底抛光过程中与磨料表面接触,以判断基底抛光工作中使用的固定环的更换时间,以显示预先选择的量解决方案:固定环22包括底层(或磨损)层34和上层(或支撑)层36。磨损标记38的视觉指示器布置在固定环22的外表面上在抛光基板时,对该视觉指示器进行视觉检查。磨损标记38由底层34和上层36之间的颜色变化形成。这些层由不同的材料组成形成。底层34由可与磨料垫的磨料垫接触而不会产生不良影响的诸如“TEFLON”基材的材料形成(例如,可从DuPont获得的“ZYMAXX”成形材料)。 ;版权:(C)2001,日本特许厅

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