PROBLEM TO BE SOLVED: To adjust the micro bar of an electron microscope by forming a vertical side wall around the specific region of a photo resist layer, and determining wavelength with a periodical shape of the vertical side wall according to the wavelength of light and the refractive index of the photo resist layer. ;SOLUTION: A photo resist layer 22 is formed on the surface of a semiconductor wafer 20, a specific region on the photo resist layer 22 is exposed to light with a far ultraviolet laser beam with short wavelength being generated by krypton fluoride or argon fluoride and is subjected to development, thus forming column structure 26. Then, a vertical side wall 28 with a periodical waveform in a shape similar to a sinusoidal waveform is formed on the side surface of the column structure 26, and the wavelength of the periodical shape of the vertical side wall 28 is determined by the refractive index between a light wave and the photo resist layer 22, thus adjusting the micro bar of an electron microscope.;COPYRIGHT: (C)2001,JPO
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