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PARTICLE QUANTITY EVALUATION DEVICE AND DIP TYPE WASHING SYSTEM AND PARTICLE STUCK QUANTITY EVALUATING METHOD

机译:颗粒物质量评估装置和浸洗系统及颗粒物量评估方法

摘要

PROBLEM TO BE SOLVED: To realize quantitative evaluation of actual particle-stuck quantity in liquid with high accuracy and washing degree evaluation with low cost and high reliability without using a monitor substrate.;SOLUTION: This device is provided with a residual liquid recovering pan 12 for recovering residual liquid, and a residual liquid quantitative measuring tank 13 for in-liquid particle measurement are installed between a first substrate treating tank 20A and a second substrate treating tank 20B. The residual liquid dropped from a substrate 60, when the substrate 60 is conveyed from the first substrate treating tank 20A to the second substrate treating tank 20B by using a substrate conveying means 50, is recovered by a residual liquid recovering pan 12 and the residual liquid quantitative measuring tank 13 to form sample liquid. The sample liquid is diluted with pure water from a pure water supply source 30 in a pure water quantitative tank 14 by a fixed quantity for measuring by an in-liquid particle measuring instrument 40.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:在不使用监测基板的情况下,可以高精度,定量地评估液体中的实际颗粒残留量,并以低成本和高可靠性实现洗涤度评估。解决方案:该设备配备有残留液体回收盘12在第1基板处理槽20A与第2基板处理槽20B之间,设置有用于回收残留液体的液体残留量定量液槽13和用于液体残留量测定的液体残留量定量槽13。当使用基板传送装置50将基板60从第一基板处理槽20A传送到第二基板处理槽20B时,从基板60滴下的残留液体被残留液体回收盘12和残留液体回收。定量测量罐13以形成样品液体。在纯水定量罐14中,用来自纯水供应源30的纯水将样品液稀释成一定量,用液体中颗粒测量仪40进行测量。版权所有:(C)2000,JPO

著录项

  • 公开/公告号JP2000343048A

    专利类型

  • 公开/公告日2000-12-12

    原文格式PDF

  • 申请/专利权人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC;

    申请/专利号JP19990156608

  • 发明设计人 DOI MINORU;

    申请日1999-06-03

  • 分类号B08B3/04;G01N15/06;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 01:28:12

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