首页> 外国专利> LIQUID DOUBLE ALKOXIDE OF NIOBIUM, TANTALUM AND LITHIUM, ITS PRODUCTION AND PRODUCTION OF MULTIPLE OXIDE DIELECTRIC THIN FILM USING IT

LIQUID DOUBLE ALKOXIDE OF NIOBIUM, TANTALUM AND LITHIUM, ITS PRODUCTION AND PRODUCTION OF MULTIPLE OXIDE DIELECTRIC THIN FILM USING IT

机译:铌,钽和锂的液态双烷氧化物及其生产和使用它的多氧化物介电薄膜的生产

摘要

PROBLEM TO BE SOLVED: To provide a new double alkoxide of niobium, tantalum and lithium hard to be thermal-dissociated, being in a leg. at room temp. and having the properties of beihng capable of distillation, to provide a method for producing it and to provide a method for producing a multiple oxide dielectric thin film using the compd. ;SOLUTION: This new compd. LiM(OC2H5)4(OC2H4OCH3)2 (M is Nb orTa) is a liq. at room temp., is hard to thermal-dissociated and has the vapor pressure of about 0.3 Torr at 190°C. The compd. can be produced by bringing Li(OC2H4 OCH3) into reaction with M(OC2H5)4(OC2H4OCH3) and next distillating and recovering the same. By using the compd. as the raw material for a CVD method, an LiNbO3 thin film and an LiTaO3 thin film for optical elements can be produced.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:提供新的铌,钽和锂的双烷氧化物,难于热分解。在室温下本发明提供了一种具有可蒸馏性的性质,提供了一种制备方法,并提供了使用所述混合物制备多氧化物介电薄膜的方法。 ;解决方案:此新版本。 LiM(OC 2 H 5)4(OC 2 H 4 OCH 3)2(M为Nb或Ta)为液体。在室温下,其难以热解,并且在190℃下具有约0.3Torr的蒸气压。该compd。可以通过使Li(OC2H4OCH3)与M(OC2H5)4(OC2H4OCH3)反应,然后蒸馏并回收来制备。通过使用compd。作为CVD法的原料,可以制造光学元件用的LiNbO3薄膜和LiTaO3薄膜。COPYRIGHT:(C)2001,JPO

著录项

  • 公开/公告号JP2001049435A

    专利类型

  • 公开/公告日2001-02-20

    原文格式PDF

  • 申请/专利权人 KOJUNDO CHEM LAB CO LTD;

    申请/专利号JP19990256105

  • 发明设计人 KADOKURA HIDEKIMI;OKUHARA YUMIE;

    申请日1999-08-06

  • 分类号C23C16/40;C07F9/00;C07F19/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:28:04

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