EXPOSURE CONTROL METHOD, ALIGNER AND LASER BEAM OUTPUTTING DEVICE

摘要

PROBLEM TO BE SOLVED: To follow-up the wavelength reduction of exposure beams by quickly transferring energy data between an aligner main body and a laser beam outputting device. ;SOLUTION: In this method for controlling exposure, the energy data of exposing beams L detected by an exposure sensor 29 provided at an aligner main body 2 are transmitted through an interface 31 and an interface 32 for setting target energy constituted of a high speed parallel interface to an excimer laser light source 1, and the following pulse emission of the exposing beams L is controlled based on this.;COPYRIGHT: (C)2000,JPO