BEAM OUTPUT CONTROL METHOD, BEAM OUTPUT DEVICE, EXPOSURE SYSTEM, AND MANUFACTURING METHOD OF DEVICE USING THE EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To allow an aligner with a pulse laser light source to perform switch control in response to an operation of the pulse laser light source, by controlling output of a pulse energy source according to an operation of an aligner, the pulse energy source performing pulse emission of an exposure beam. SOLUTION: A main control device 30 has four modes for exercising control according to an operation of an aligner. First, a first mode is provided for controlling energy of a laser beam LB, which is emitted from an excimer laser light source 1 based on a result detected by an energy monitor 1c provided in the excimer laser light source 1. A second mode is provided for controlling energy of the laser beam LB, which is emitted from the excimer laser light source 1 based on a detected result of an integrator sensor 25. Further, a third mode is provided for exercising control to reduce irregularity of energy for each pulse of the laser beam LB, and a fourth mode is provided for exercising control such that the laser beam LB has a uniform average moving.