首页> 外国专利> METHOD FOR PRODUCING GLASS-LIKE SILICA LAYER WITH INDUCTIVELY COUPLED PLASMA TORCH AND PRODUCTION DEVICE TO BE USED

METHOD FOR PRODUCING GLASS-LIKE SILICA LAYER WITH INDUCTIVELY COUPLED PLASMA TORCH AND PRODUCTION DEVICE TO BE USED

机译:使用具有感应耦合等离子体炬的玻璃状二氧化硅层的生产方法及生产装置

摘要

PROBLEM TO BE SOLVED: To provide a production method and a production device for accumulating a silica layer doped with a pure or proper dopant on a flat target. ;SOLUTION: This production device is provided with an inductively coupled plasma.torch 1 and a nozzle 9 for supplying a gas into the touch 1. The nozzle 9 is connected to a reagent source, and a reagent is supplied into the nozzle 9 in a gaseous state. The nozzle 9 is disposed so that the reagent can be supplied into the tail of a plasma generated from a gas having a pressure approximately equal to the atmospheric pressure in a free atmosphere generated in the plasma torch 1. A target 2 is configured so as to be allowed to pass above the touch 1 on the production of the silica layer. Therein, the height position of the target can arbitrarily be changed.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种用于将掺杂有纯的或适当的掺杂剂的二氧化硅层堆积在平坦的靶材上的制造方法和制造装置。 ;解决方案:此生产设备配有感应耦合的等离子炬1和喷嘴9,用于向触摸屏1中供应气体。喷嘴9连接到试剂源,试剂通过喷嘴1注入到喷嘴9中。气态。设置喷嘴9,以便能够将试剂供应到由在等离子炬1中产生的自由气氛中由压力近似等于大气压的气体所产生的等离子体的尾部中。靶2被构造为使得允许其通过二氧化硅层生产上的接触1上方。其中,目标物的高度位置可以任意改变。;版权:(C)2001,JPO

著录项

  • 公开/公告号JP2001058838A

    专利类型

  • 公开/公告日2001-03-06

    原文格式PDF

  • 申请/专利权人 AGILENT TECHNOL INC;

    申请/专利号JP20000204133

  • 发明设计人 PANCIATICHI CRISTINA;

    申请日2000-07-05

  • 分类号C03B19/14;C03B8/04;C03B20/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:26:47

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