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WET PROCESSING METHODS FOR THE MANUFACTURE OF ELECTRONIC COMPONENTS USING SEQUENTIAL CHEMICAL PROCESSING

机译:顺序化学处理制造电子元件的湿法处理方法

摘要

The present invention is directed to wet processing methods for the manufacture of electronic component precursors, such as semiconductor wafers used in integrated circuits. More specifically, this invention relates to methods, for example, prediffusion cleaning, stripping, and etching of electronic component precursors using sequential chemical processing techniques.
机译:本发明涉及用于制造电子部件前驱体(例如集成电路中使用的半导体晶片)的湿法处理方法。更具体地,本发明涉及方法,例如,使用顺序化学处理技术的电子部件前体的预扩散清洁,剥离和蚀刻。

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