Method for making microporous silicone resins with narrow pore-size distributions

摘要

The present invention refers to a silicone resin where at least 5 percent of silicon atoms are substituted with at least one triarylsilylalkylene group described by formula Ar₃Si(CH₂)_p- and at least 45 percent of silicon atoms are substituted with at least one hydrogen atom, where each Ar is an independently selected aryl group and p=2 to 20, to a method making same and to a method for preparing a microporous silicone resin which can be used to form low dielectric constant films useful for electrical insulating coatings on electronic devices comprising heating the above silicone resin in an inert atmosphere at a temperature sufficient to effect thermolysis of the triarylsilylalkylene groups from the silicon atoms and to microporous silicone resins obtainable thereby. .