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METHOD FOR MANUFACTURING SMCO GROUP HARD MAGNETIC THIN FILM

机译:制造SMCO组硬磁性薄膜的方法

摘要

PURPOSE: A method for manufacturing an SmCo group hard magnetic thin film is provided to manufacture the SmCo group thin film by controlling a process parameter appositely using a laser ablation process for manufacturing a thin film by irradiating an excimer laser beam to a target fixed in a reaction room. CONSTITUTION: In a method for manufacturing an SmCo group hard magnetic thin film, an SmCo group target consisted of Sm100-xCox(%) is fixed in a vaccum state of a reaction room and a single crystal Si substrate is heated. A pulse width of a fixed Q mode in Nd-YAG laser beam is set as 100-250 microsecond by prolonging an oscillation time optically after rotating the SmCo group target and the Si substrate. The Nd-YAG laser beam is irradiated on the target to form the SmCo group thin film on the substrate.
机译:目的:提供一种制造SmCo基硬磁性薄膜的方法,该方法通过使用准分子激光束照射到固定在靶材上的靶材的激光烧蚀工艺适当地控制工艺参数来制造SmCo基薄膜。反应室。组成:一种制造SmCo基硬磁薄膜的方法,将由Sm100-xCox(%)组成的SmCo基靶固定在反应室的真空状态下,并加热单晶硅衬底。通过在旋转SmCo基靶和Si衬底之后光学地延长振荡时间,将Nd-YAG激光束中的固定Q模式的脉冲宽度设置为100-250微秒。将Nd-YAG激光束照射到目标上,以在基板上形成SmCo基薄膜。

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