首页> 外国专利> ZnS-SERIES SINTERED MATERIAL AND METHOD FOR PRODUCING THE SAME TARGET USING THE ZnS-SERIES SINTERED MATERIAL THIN FILM AND OPTICAL RECORDING MEDIUM USING THE THIN FILM

ZnS-SERIES SINTERED MATERIAL AND METHOD FOR PRODUCING THE SAME TARGET USING THE ZnS-SERIES SINTERED MATERIAL THIN FILM AND OPTICAL RECORDING MEDIUM USING THE THIN FILM

机译:ZnS系列烧结材料以及使用该ZnS系列烧结材料薄膜和光学记录介质制备相同靶材的方法

摘要

PURPOSE: A manufacturing method of ZnS-based sintered material is provided to improve excellent shaping property and to be used as a target for DC sputtering. CONSTITUTION: ZnS-based sintering material consists essentially of ZnS and contains niobium oxide. The sintering material is converted into a ZnS-based sintered compact and is used for a sputtering target by regulating the content of niobium oxide to 10-50wt% expressed in terms of Nb2O5 and by regulating the surface resistivity thereof to 10Omega/square surface. The target of the sintered compact can be utilized for DC sputtering having a high thin-film forming rate. The sintered compact is obtained by preparing a mixture of ZnS powder having an average particle diameter of 0.5-20 micrometers with niobium oxide powder having an average particle diameter of 5 micrometers, by hot pressing the resultant mixture at 800-1100deg.C and by providing the sintered compact of a desired shape.
机译:目的:提供一种基于ZnS的烧结材料的制造方法,以改善优异的成型性能,并将其用作直流溅射的靶材。组成:基于ZnS的烧结材料主要由ZnS组成,并包含氧化铌。通过将氧化铌的含量调节为以Nb 2 O 5表示的10-50wt%并且通过将其表面电阻率调节为10Omega /平方表面,将该烧结材料转化为基于ZnS的烧结体,并用于溅射靶。可以将烧结体的靶用于具有高薄膜形成速率的DC溅射中。通过制备平均粒径为0.5-20微米的ZnS粉末与平均粒径为5微米的氧化铌粉末的混合物,通过在800-1100℃下热压所得混合物并提供一种烧结体来获得。所需形状的烧结体。

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