Adhesion material for preventing PED effect on photolithography

摘要

PURPOSE: Provided is an adhesive substance for preventing patterns from tearing in a photolithography, which can improve adhesive property between a photoresist and a wafer by spreading the adhesive substance before spreading the photoresist. CONSTITUTION: The adhesive substance for preventing the patterns from tearing is a siloxane compound represented by the formula 1, wherein n is an integer of 3-8 and R is a halogen atom substituted or unsubstituted C2-C6 alkyl or a hydrogen atom. The adhesive substance contains an aliphatic/aromatic substituent and dose not generate ammonia gas.