HIGH-DENSITY PLASMA SOURCE FOR IONIZED METAL DEPOSITION CAPABLE OF EXCITING A PLASMA WAVE

摘要

The advantage of a magnetron for low-pressure plasma sputtering or continuous magnetic sputtering is that it has an area reduction but excellent target coverage. The magnetron includes an outer pole face surrounding an inner pole face having a gap therebetween. The magnetron external stimulus of the invention is smaller than a circular magnetron similarly extending from the center of the target to its periphery. A triangular shape, preferably having a small apex angle of 20 to 30 degrees, can be formed from an outer bar magnet of magnetic polarity surrounding the inner magnet of polarity of the other magnet. The magnetron interacts with 1-20 eV electrons of the plasma to generate a plasma wave at about 22 MHz which increases the plasma density.