首页> 外国专利> Wafer Probing System and Wafer Probing Needle Calibrating Method Using Those

Wafer Probing System and Wafer Probing Needle Calibrating Method Using Those

机译:晶圆探测系统和使用该系统的晶圆探测针校准方法

摘要

The present invention wafer probing equipment and relates to a needle calibration method for wafer inspection using the same, according to the wafer probe probing devices a plurality of which needles are equipped with the installed probe card for testing a wafer, the wafer chuck the wafer is placed, the wafer stifle the chuck horizontal and chuck the wafer to move up and down in the stand, are provided on the chuck the wafer pedestal is provided on the chuck needle chuck, the wafer in contact with the plurality of needles individually stand camera to identify the positions of the plurality of needle , and receives data that indicates the position of the needle by the camera and a controller for controlling the needle chuck and the wafer chuck moved, the needle chuck the wafer by providing a shield wire surrounding the signal line, and the signal line having conductivity sword A needle can be individually brought into contact.
机译:本发明的晶片探测设备,涉及一种使用该晶片探测设备的晶片检查的针校准方法,根据该晶片探针探测设备,其中多个针装有已安装的用于测试晶片的探测卡,晶片卡盘是晶片放置后,将晶片扼住卡盘水平,并使晶片在支架中上下移动,在晶片卡盘上提供晶片基座,在针卡盘上提供晶片基座,与多根针接触的晶片分别站立相机识别多个针的位置,并通过照相机和用于控制针卡盘和晶片卡盘移动的控制器接收指示针位置的数据,该控制器通过在信号线周围提供屏蔽线来夹持晶片,并且信号线具有导电性。针可以单独接触。

著录项

  • 公开/公告号KR100301060B1

    专利类型

  • 公开/公告日2001-11-01

    原文格式PDF

  • 申请/专利权人 NULL NULL;

    申请/专利号KR19990029733

  • 发明设计人 박석호;강기상;오세장;

    申请日1999-07-22

  • 分类号H01L21/66;

  • 国家 KR

  • 入库时间 2022-08-22 01:12:07

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