CATHODE FOR SPRAYING OR ELECTRIC-ARC EVAPORATION (ALTERNATIVES) AND DEVICE FOR COATING OR ION-BEAM IMPLANTATION OF SUBSTRATES

摘要

FIELD: physics; magnetron cathodes. SUBSTANCE: proposed linear cathode of magnetron may be used as steam or plasma source for coating substrate by evaporation or ion treatment. Cathode is made in the form of elongated rectangular bar with material evaporated from surface on bar periphery at two opposite sides and around both ends. Magnetic field built up over entire surface being evaporated has component parallel to surface and perpendicular to longitudinal direction of cathode to form enclosed magnetic channel around periphery that functions to direct arc discharge or plasma evaporation discharge. Cathode may be configured either for spraying or for electric-arc evaporation by selecting magnetic field strength and side holding facilities. Proposed design ensures uniform erosion of cathode and evaporated material flow in two directions over enlarged length; geometry of substrate fastening and displacement provides for bidirectional distribution of steam emission. EFFECT: improved uniformity of evaporation or implantation on large areas. 26 cl, 10 dwg