首页> 外国专利> Method for production of a photo-active surface layer where heat-treatment is in short busts so that sub-surface layers are unaffected by the heat, thus broadening the range of materials the surface layers can be used with

Method for production of a photo-active surface layer where heat-treatment is in short busts so that sub-surface layers are unaffected by the heat, thus broadening the range of materials the surface layers can be used with

机译:短时间热处理的光敏表面层的生产方法,以使次表面层不受热的影响,从而扩大了表面层可用于的材料范围

摘要

Method in which photoactive modification of an object surface layer is effected during or before heat treatment of the surface layer. The heat treatment energy is supplied in bursts of over 1000 W per cm2, with the bursts of such short duration that only the surface layer is heated sufficiently to allow the required photo-active modification to take place. The object on which the surface layer is deposited unaffected. An Independent claim is made for a device for producing a photoactive layer on an object.
机译:在表面层的热处理期间或之前,对物体表面层进行光敏改性的方法。热处理能量以超过每平方厘米1000 W的脉冲数提供,脉冲持续时间如此短,以至仅表面层被充分加热以允许进行所需的光敏改性。表面层沉积在其上的物体不受影响。独立的权利要求用于在物体上产生光敏层的装置。

著录项

  • 公开/公告号DE10001565A1

    专利类型

  • 公开/公告日2001-07-19

    原文格式PDF

  • 申请/专利权人 BIEDERMANN ANDREAS;

    申请/专利号DE20001001565

  • 发明设计人 BIEDERMANN ANDREAS;

    申请日2000-01-15

  • 分类号B05D3/00;

  • 国家 DE

  • 入库时间 2022-08-22 01:10:02

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