首页> 外国专利> Heterojunction-type field effect transistor for portable telephone, has gate electrode formed over p-type low resistance area of barrier layer inbetween source and drain electrodes

Heterojunction-type field effect transistor for portable telephone, has gate electrode formed over p-type low resistance area of barrier layer inbetween source and drain electrodes

机译:用于便携式电话的异质结型场效应晶体管,其栅电极形成在源电极和漏电极之间的势垒层的p型低电阻区域上

摘要

The barrier layer (6) is formed on carrier supply layer (5a) and has band gap narrower than the carrier supply layer (5a). Gate electrode (11) is formed inbetween source electrode (9) and drain electrode (10) formed over p-type low resistance area (13) of barrier layer (6). The low resistance area of barrier layer and barrier layer have opposite conductivity. An Independent claim is also included for field effect transistor manufacturing method.
机译:阻挡层(6)形成在载流子供应层(5a)上,并且具有比载流子供应层(5a)窄的带隙。在势垒层(6)的p型低电阻区域(13)上形成的源电极(9)和漏电极(10)之间形成有栅电极(11)。阻挡层和阻挡层的低电阻区域具有相反的导电性。场效应晶体管的制造方法也包括独立权利要求。

著录项

  • 公开/公告号DE10024510A1

    专利类型

  • 公开/公告日2000-12-21

    原文格式PDF

  • 申请/专利权人 SONY CORP. TOKIO/TOKYO;

    申请/专利号DE2000124510

  • 发明设计人 WADA SHINICHI;

    申请日2000-05-18

  • 分类号H01L29/778;H01L21/337;

  • 国家 DE

  • 入库时间 2022-08-22 01:09:49

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号