Brief description of embodiments of the films and dielectric structures oriented at the request

摘要

During deposition, a voltage is applied to the substrate support (30). This is controlled suitably to impose crystalline orientation in the layers deposited. Preferred Features: The voltage applied is varied, during deposition. It is applied to the substrate support, or electrodes (32) upon it, and alternates between a zero- and a non-zero value. The non-zero value is approximately 10% of the RF voltage amplitude. It is 150-300 V. The deposit can be polarized. The material is ferro-electric. Voltage is applied to the electrodes of the substrate (32) or the substrate support (30); these are shaped to adjust crystalline orientation in a plane parallel to the substrate. The substrate is amorphous or crystalline. Temperature of operation is below 400 deg C.